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TechConnect World 2010: A visual approach on MEMS process modelling using device cross-sections |
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Abstract
With MEMS entering fast moving consumer markets the need for more efficient design concepts becomes apparent. Without a common technology platform in sight, the only feasible solution seems to be extensive modularization and re-use of existing manufacturing technology. In this paper we propose a visual approach on process modelling by presenting a software tool that supports the device engineer in specifying a set of device cross-sections that satisfy the specic requirements of thin lm manufacturing processes. The drawing tools are modeled to represent typical eects of thin-lm semiconductor fabrication techniques. Geometrical analysis algorithms ensure adherence to manufacturing constraints. The tool is currently under evaluation within the European project CORONA (CP-FP 213969-2).
The full paper can be downloaded here. |
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TechConnect World 2010: The challenges of statistical experiment design in process development |
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Abstract
Process development, especially in the high-tech sectors, is an extremely complex task. The key challenge is developing a range of process recipes and testing these recipes via experimentation. For setting up the experiments usually a Design of Experiment (DoE) approach is used varying the key driving parameters, running the experiment and evaluating the manufacturing results. Today Statistical Experimental Design (SED) techniques are used to optimize the amount of necessary experiments. But there are challenges with this approach. This paper introduces a software driven development approach covering the full process development cycle. It described how the current practices of SED are extended, matured and how the resilience is improved. It highlights the gains in time and cost. Potential challenges in introducing such an approach are indicated as well.
The full paper can be downloaded here. |
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